Engineering firm ALLOS Semiconductors GmbH of Dresden, Germany is collaborating with professor Ohkawa and his team at Saudi Arabia’s King Abdullah University of Science and Technology (KAUST) to realize high-efficiency nitride-based red LEDs on large-diameter silicon substrates.
The researchers have already grown red LEDs on sapphire substrates and gallium oxide (Ga2O3) substrates (‘633-nm InGaN-based red LEDs grown on thick GaN underlying layers with reducing in-plane residual stress.
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