AIXTRON and ams OSRAM announce qualification of AIXTRON G5+ C and G10-AsP systems

ams OSRAM has qualified AIXTRON AIX G5+ C and G10-AsP MOCVD systems on 200mm wafers for a Micro LED application.

The MOCVD systems AIX G5+ C and the new G10-AsP from AIXTRON SE offer AIXTRON planetary technology which is paving the pathway for the next generation of high-resolution Micro LED displays. In spring 2022, ams OSRAM had announced plans to create additional manufacturing capacity in 200mm for the production of LED and Micro LED at its existing location in Malaysia. The MOCVD systems are expected to help enable volume production of Micro LED for a new generation of display applications.

Micro LED technology offers very significant advantages for display technology such as higher pixel density, longer lifetime, higher brightness, faster switching speed and a wider color spectrum. An important benefit is also the low relative energy consumption, which qualifies Micro LED ideally for upcoming generations of smaller display-equipped consumer devices which provide a very limited space for batteries.

The production of Micro LED comes with special requirements: Micro LED volume production includes a special transfer process where multiple thousands of LED chips (arrays) of just micrometers in size are picked up and transferred. Any defect can result in dead pixels that can make an entire array useless. Hence, an almost error-free epitaxy process is necessary, minimizing defects and allowing for high yield and economically viable production of Micro LED.

AIXTRON’s new G10-AsP epitaxy tool has been designed to address the specific needs of this application: It is the world's first fully automated AsP reactor offering cassette-to-cassette wafer loading as well as a cleaning mechanism based on in-situ etching. Together, these two features have a major impact on the yield performance. In addition, the AIXTRON system offers the advantages of batch reactor technology: it comes with the lowest production cost per wafer currently available in the market and the highest throughput per cleanroom area. At the same time, the new tool comes with precise flow and temperature control permitting the best material uniformities run after run.